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Wafer Preparation

Wafer Preparation services are offered as part of your turnkey packaging and assembly project or as stand-alone services based on your individual needs. With our advanced wafer processing equipment, QP Technologies offers expert backgrinding services for wafer-level packaging or other packaging requiring thin and ultra-thin (<100 um) die.

Thinning Equipment Technology and Market Trends for …

substrate type. From a wafer substrate point of view, Si-based MOSFETs involve wafer thickness of around 50 µm to 55 µm on 300 mm diameter wafers in HVM with a trend towards thinning down to 30 µm. Wafer thicknesses for SiC-based devices are rarely lower than 200 µm even though thickness reduction is expected to go

Study into grinding force in back grinding of wafer with outer …

Silicon wafers are the most widely used substrate material in integrated circuit manufacturing [1,2,3].Back grinding of wafer with outer rim (BGWOR) is a new method for carrier-less thinning of silicon wafers, and its working principle is shown in Fig. 1.Different from conventional back grinding, the BGWOR process only grinds the inner …

Impacts of back-grinding process parameters on the

Impacts of back-grinding process parameters on the strength of thinned silicon wafer. BIE Xiaorui, QIN Fei*, ZHOU Linfeng, SUN Jinglong, CHEN Pei. College of Mechanical …

Fine grinding of silicon wafers: designed experiments

Manufacturing processes for silicon based ICs (after Bawa et al. [2], Fukami et al. [3], Tonshoff et al. [4] and Vandamme et al. [5]). Fig. 3. Illustration of wafer surface grinding. ment of rough polishing; and (c) back-grinding the back side of the wafer after circuits are developed on the front side. Here, (a) and (b) take place inside ...

Wafer Grinders

Precision backgrinding is especially well suited for processing hard, brittle materials such as silicon, silicon carbide, sapphire, Indium Phosphide, Gallium Arsenide, glass, and many others. The right grind equipment, whether its for silicon wafer grinding or any other substrate, Axus Technology has you covered in producing the leading-edge ...

High-clean adhesive tape

The ICROS™ thin wafer backgrinding tape line features special anti-warpage properties that significantly flattens the wafer. This tape has a warpage of 2mm versus 26mm for conventional tape which reduces risk of wafer breakage during handling and transportation. In addition, the super clean adhesive is designed to eliminate the rinse process.

(PDF) Impacts of back-grinding process …

Silicon wafer is a predominant substrate material in integrated circuits (IC) manufacturing. Currently, grinding is employed as a major machining method for back-thinning and flattening of the wafers.

Application of the surface planer process to Cu pillars and wafer …

We used the surface planer process to minimize the within-die and within-wafer nonuniformity caused by the nonoptimized Cu pillar and Si thinning processes. The height variation of the planarized Cu pillars was 3.5% of the within-wafer uniformity in a 300-mm wafer, which represents a substantial reduction of the post-electrodeposition height …

Mitsui Chemicals America, Inc. ICROS® TAPE

ICROS® TAPE is used to manufacture integrated circuits as a surface protective tape in the silicon wafer back-grinding process. Since this backgrinding wafer tape uses special adhesives which hardly transfer to the wafer surface, it can reduce production costs and eliminate environmental problems by dispensing with organic washing solvents.

Silicon wafer thinning, the singulation process, and die …

formed on the surface of a silicon wafer. Subsequently, in back-end production, the wafer backside is thinned and the wafer is singulated by dicing. The chips are then encapsulated in a package that will be delivered to end-users. The need for thinner chips has been growing in recent years to support lower package heights and allow

Effects of taping on grinding quality of silicon wafers in …

Grinding experiments using coarse and fine resinbond diamond grinding wheels were performed on silicon wafers with tapes of different thicknesses to …

Warping of silicon wafers subjected to back-grinding process

However, a back-thinned wafer is often deflected after grinding, which can impose problems in the subsequent handling and transportation processes, leading to …

Silicon Wafer Backgrinding & Wafer Thinning …

Our capabilities include: Thin wafers from 4" to 8" diameter. Backgrinding to target thickness of 0.025mm (0.001") Single die, partial wafer, or bumped wafer backgrinding. Thickness variance under 5 microns. Syagrus …

Wafer Processing for High Topography Bumped

Multiplying Wafer Backgrinding Throughput: Backgrinding Temporary Bonding Adhesive on Disposable Carrier; Dicing & Grinding Tape FAQs; Substrate and Component Attach Adhesives. ... GD-PRCL-350-WS uses a disposable carrier that is closely matched to that of the device wafer such as silicon. ...

Backgrinding Tape Selection Analysis for Adhesion …

Though on the specific silicon wafer technology has been developed polyimide resin 36 is used. 37 ... 77 2.1 Wafer Backgrinding Process 78 79 Wafer back grinding is the thinning of semiconductor wafers by removing material from the 80 unpolished wafer back side. Wafers are often fabricated thicker than necessary, normally at

:HW …

t h P 2 max 2 3 A σ= • [1] E = ∫Pdx [2] where Pmax is the load at the fracture point, l is the support span, t is the thickness of the die, and h is the width of the die. TABLE I. Various wafer-thinning processes. Wafer Thinning method Stress relief removal A backgrinding only - B wet etching only (wet chemical wafer thinning)

Simulation of Process-Stress Induced Warpage of Silicon …

model of a 6" diameter Si wafer with a 5.4" diameter Al film on it. The hatched portion represents the Al film. The wafer is perfectly circular except for a flat of 2.6" at the top. The initial thickness of the wafer is 25 mils where as the Al film layer is only 5 um thick. The wafer is finally back-ground to a thickness of 6 mils.

Backgrinding

Backgrinding is the process of removal of silicon from the back of wafers following conventional semiconductor processing. The process is primarily utilized in thinning wafers for commercial semiconductor wafer fabs. Wafers are first laminated using an automatic taping machine. After inspection, they are placed on a Disco 84X series infeed grinder.

The process of backside grinding of silicon wafer

Now the diameter of more than 200mm of large size silicon wafer backgrinding (backgrinding) mostly adopts the ultra-precision grinding technology based on the principle of white rotary silicon ...

Wafer Backgrinding | Wafer Dicing | Wafer Inspection

We perform all SiC, fused silica, quartz, and silicon wafer backgrinding processes in a class 10K cleanroom. Automated Wafer Dicing. Double pass or "step" cutting ensures high quality and accurate SiC, fused silica, quartz, and silicon wafer dicing. We can dice wafers as thin as 0.020mm (0.0008") and up to 300mm (12.0") in diameter with ...

Impacts of back-grinding process parameters on the

characteristic strength of silicon wafer under different feed rates were determined to be 325.23, 324.53, and 314.57 MPa for 0.05,0.15, and 0.25 /lm/s, respectively.

Wafer (elektronik)

Wafer adalah bahan dasar dari komponen sistem mikro. Wafer biasanya berbentuk lempengan tipis berbentuk lingkaran dengan garis di salah satu sisinya. Pada umumnya wafer terbuat dari kristal silikon.. Bentuk wafer silikon Pembuatan dan pemurnian silikon. Dari bahan dasar pasir yang mengandung silikon oksida, dibakar menggunakan karbon …

Disco makes hexagonal and non-regular chips possible

Silicon this thin has almost the consistency of mylar or other high-tech plastics, it is really cool to play with. That is why I have a background wafer on my desk, it is shiny and neato. Back to the serious side, a floppy wafer with delicate far sub-micron transistors on it is really hard to cut to extremely tight tolerances with a circular saw.

Warping of silicon wafers subjected to back-grinding process

This study investigates warping of silicon wafers in ultra-precision grinding-based back-thinning process. By analyzing the interactions between the wafer and the vacuum chuck, together with the machining stress distributions in damage layer of ground wafer, the study establishes a mathematical model to describe wafer warping during the …

Impacts of back-grinding process parameters on the …

In this paper, three-point bending test was adopted to evaluate the thinned wafer fracture strength, and the impacts of back-grinding process parameters on the wafer fracture …

Application of the surface planer process to Cu pillars and wafer …

Wafer warpage is one of the main concerns during the backgrinding process. Wafer warpage varies depending on the wafer backgrinding stress and backgrinding tape (hereinafter referred to as BG tape ...

The back-end process: Step 3 – Wafer backgrinding

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(PDF) Wafer deposition/metallization and back grind, …researchgateStep 1: The back-end process | Semiconductor Digestsst.semiconductor-diges…Recommended to you based on what's popular • Feedback
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    Warping of Silicon Wafers Subjected to Back …

    WebPDF | This study investigates warping of silicon wafers in ultra-precision grinding-based back-thinning process. By analyzing the …

  • Fast and precise surface measurement of back-grinding silicon …

    The new type of scattered light sensor to measure back- grinding wafer is shown in FIGURE 1. The light source (1) illuminates nearly perpendicular the wafer surface with a 670 nm red LED spot of 0.9 mm spot size (2). This is the standard modus for fast measurement with medium lateral resolution. For high lateral resolution, another spot with 0. ...